November 6-10


The following half-day workshops will take place on Monday 6 November:

There is a high demand for collaborations between academia and industry that apply fundamental scientific understanding and state-of-the-art plasma diagnostics to practical problems that cannot be solved empirically. This workshop aims at identifying potential topics of partnerships between industry and academia as well as problems that limit their foundation. Selected examples of successful collaborations will be presented.
One of several examples is the field of process control: Typically, academia aims at developing complicated self-consistent and slow models that provide a detailed understanding of fundamental effects, while the industry requires more simplified quick models for real-time
process control, that do not have to be self-consistent. Meanwhile, industry often does not characterize plasmas sufficiently via complementary diagnostics to provide a basis for the unique identification of problems, that limit process control, and for their solution based on scientific understanding of the plasma physics. Clearly, the combination of the complementary expertise of academia and industry is required to move forward.

Monday Morning, 6 November 2017
Room: Salon D at 9:00
Julian Schulze, West Virginia University/Bochum University, presiding
AM1 1 Characterization and diagnostics of RF plasmas under manufacturing conditions, Michael Klick
AM1 2 Progress on Voltage Waveform Tailoring for plasmas: From science to process, from lab to fab, Erik Johnson, Sebastien Dine, Jean-Paul Booth
AM1 3 The status of etching processes in semiconductor fabrication, and upcoming challenges, Jin-Young Bang, Sungil Cho
AM1 4 Successes, failures, and lessons learned navigating industry supported research in academia, Steven Shannon
AM1 5 Application perspective of plasma science and technology for food and agriculture, Wonho Choe, Cheorun Jo, Youbong Lim, Suk-Jae Yoo
AM1 6 Application of the multipole resonance probe to industrially relevant processes, Moritz Oberberg, Marcel Fiebrandt, Stefan Ries, Christian Woelfel, Peter Awakowicz



Monday Morning, 6 November 2017
Room: Foster at 9:00
Mark Koepke, West Virginia University, presiding
AM4 1 Scientific Paper Writing Workshop, led by Dr. Bodil Holst*, Professor, Head of Nanophysics Group, University of Bergen.
This 3.5-hour morning workshop has two main goals. Firstly, to provide the participants
with a set of “tools” helping them to present their scientific results in a clear and interesting way and, secondly, to make them aware of various strategic issues connected to paper writing (in which journal to publish, proper cover letter to the editor, etc.). The workshop is presented in English.
The participants are encouraged to bring drafts of own papers, in particular an abstract for at least one paper, but this is not a prerequisite.

*Please consider buying her book Scientific Paper Writing - A Survival Guide, illustrated by Jorge
Cham from PhD comics.
Dr. Bodil Holst, Professor, Head of Nanophysics Group
University of Bergen, Department of Physics and Technology
Allegaten 55
5007 Bergen, Norway
Fax. +47 55 58 94 40”


Monday Afternoon, 6 November 2017
Room: Salon D at 14:00
Douglas Keil, LAM, presiding
BM1 1 Use of plasma sensors combined with artificial intelligence in the diagnostics and monitoring of plasma processes, Michael Hopkins, Cliodhna Harrison, Paul Scullin, David Gahan
BM1 2 The significance of RF power delivery for thin-film semiconductor plasma processes and the enhancements of innovative solutions, David J. Coumou
BM1 3 Plasma etch reactor design challenges for high RF power applications, Alexei Marakhtanov
BM1 4 Atomic layer processing of silicon dielectrics: Precursors, processes, and plasmas, David C. Smith
BM1 5 Advanced HIPIMS solution for R&D and process development, Sean Armstrong
BM1 6 Practical challenges for the integration and application of plasmas in atomic layer deposition systems, J. R. Gaines


Monday Afternoon, 6 November 2017
Room: Duquesne at 14:00
Thomas Mussenbrock, Brandenburg University of Technology, presiding
BM2 1 Modeling of industrial plasma tools and applications: experimental validation, Shahid Rauf, Samaneh Sadighi, Ajit Balakrishna, Kallol Bera, Jason Kenney, Wei Tian, Jun-Chieh Wang
BM2 2 Validation of computation by Experiment for the VSim and USim Codes, John Cary, SN Averkin, KRC Beckwith, BM Cowan, TG Jenkins, SE Kruger, M Kundrapu, C Roark, SW Sides, GR Werner
BM2 3 Combining advanced optical diagnostics and simulations to reveal chemical kinetics in atmospheric pressure plasmas, Sandra Schroeter, J. Bredin, A. R. Gibson, A. West, A. Wijaikhum, K. Niemi, H. Davies, N. Minesi, J. Dedrick, M. Foucher, J. P. Booth, N. de Oliveira, D. Joyeux, L. Nahon, Y. Gorbanev, V. Chechik, E. Wagenaars, T. Gans, D. O'Connell
BM2 4 Linking experimental measurements and numerical simulations to understand plasma-surface interaction processes, A. R. Gibson, M. Blake, J. Bredin, K. Niemi, A. Greb, B. Bruneau, E. Johnson, A. Derzsi, Z. Donko, J.-P. Booth, D. O'Connell, T. Gans
BM2 5 The effects of elementary surface processes on the plasma parameters in capacitively coupled radiofrequency discharges, Aranka Derzsi, Benedek Horvath, Manaswi Daksha, Birk Berger, Sebastian Wilczek, Jan Trieschmann, Thomas Mussenbrock, Peter Awakowicz, Zoltan Donko, Julian Schulze
BM2 6 Sputtering process data interpreted by heavy particle simulations, Jan Trieschmann, Stefan Ries, Nikita Bibinov, Peter Awakowicz, Stanislav Mraz, Jochen M. Schneider, Thomas Mussenbrock