Abstract Submission
Abstract Submission Ended on Monday, June 18, 2018 at 11:59 p.m. United States Eastern Daylight Saving Time. Acceptance of Post-Deadline abstracts ended on Wednesday, September 12, 2018.
Post-Deadline abstracts will only be considered for inclusion in poster sessions
- Visit abstract submission instructions
- Click on the blue "Submit an Abstract" button
- Select the radio button for “71st Annual Gaseous Electronics Conference”
Before you start:
- Know the number and the order of authors
- Proofread abstract
- Check abstract length
- Note the sorting category or focus topic
- Choose RTF, MS Word or LaTeX format
- If your abstract is accepted, you must be willing, present and prepared to give the presentation.
Process:
Contributed papers may be given orally in a 15-minute timeslot (12 minutes for presentation and 3 minutes for questions) or as a poster. For either mode, authors must submit an abstract, which succinctly identifies the problem, describes the approach, and summarizes the status or result of the completed or intended intellectual contribution.
Contributors must submit abstracts using the American Physical Society (APS) online web submission process at American Physical Society (APS) Online Submission.
To submit an abstract, you must
- Use the GEC sorting category list when submitting (see sorting categories below)
- Know the correct ordering of authors and collaborators, and
- Submit abstract content. The website will ask you for an APS membership number. If you are not an APS member, you may type “GEC abstract” in the member ID box when submitting.
General abstract submission information is here.
Oral And Poster Session Sorting Categories
The Executive Committee solicits contributed oral and poster presentations on the wide range of topics typically addressed at the GEC. The abstract sorting categories are listed below; but you may always contact the local secretary or an Executive Committee member for assistance if you have difficulty choosing the category which best fits your work.
1 Atomic and molecular collisional and dynamical processes
1.1 Electron and photon collisions with atoms and molecules: excitation
1.2 Electron and photon collisions with atoms and molecules: ionization
1.3 Heavy-particle collisions
1.4 Dissociation, recombination and attachment
1.5 Distribution functions and transport coefficients for electrons and ions
1.6 Other atomic and molecular collision phenomena
2 Plasma science
2.1 Nonequilibrium kinetics of low-temperature plasmas
2.2 Basic plasma physics phenomena in low- temperature plasmas
2.3 Plasma boundaries: sheaths, boundary layers, others,
2.4 Gas phase plasma chemistry
2.5 Plasma-surface interactions
2.6 Plasma diagnostic techniques
2.7 Modeling and simulation
2.8 Glows: dc, pulsed, microwave, others
2.9 Capacitively coupled plasmas
2.10 Inductively coupled plasmas
2.11 Magnetically-enhanced plasmas: ECR, helicon, magnetron, others
2.12 High pressure discharges: dielectric barrier, discharges, coronas, breakdown, sparks
2.13 Microdischarges: dc, rf, microwave
2.14 Thermal plasmas: arcs, jets, switches, others
2.15 Plasmas in liquids
2.16 Negative-ion and dust-particle-containing plasmas
2.17 Other plasma science topics
3 Plasma applications
3.1 Plasmas for light production: laser media, glows, arcs, flat panels, and novel sources
3.2 Plasma etching
3.3 Plasma deposition
3.4 Plasma ion implantation
3.5 Green plasma technologies: environmental and energy applications
3.6 Plasma processing for photovoltaic applications
3.7 Biological applications of plasmas and plasma applications in medicine
3.8 Plasma propulsion and aerodynamics
3.9 Plasmas for nanotechnologies, flexible electronics, and other emerging applications
4 Special arranged sessions
4.1 MOOSE
4.2 High Performance Computing for Plasma Applications
4.3 Plasma Diagnostics Workshop