GEC 2025 Workshop Topics and Organizers - Monday, 13 October 2025
- Plasma Photonics, Metamaterials, Strongly Coupled Plasmas - Profs. Gerrit Kroesen (TU/e, Netherlands) and Mark Cappelli (Stanford University, USA)
- Osamu Sakai, University of Shiga Prefecture, Japan, Plasma photonic crystals and metamaterials with functional output based on their spatial profiles
- Sung-Jin Park, University of Illinois, Champaign-Urbana, USA, Smart Photons from Microplasmas: Emerging Applications in Communications, Microelectronics, and Healthcare
- Jesse Rodriguez, Oregon State University, USA, In-situ inverse design of plasma metamaterials
- Min Sup Hur, Ulsan National Institute of Science and Technology (UNIST), S. Korea, New idea of plasma based pulse compression
- Gun Su Yun, Pohang University of Science and Technology (POSTECH), S. Korea, Strongly coupled plasma and photonic crystal at high pressure plasmas
- Alessio Monti, University Roma Tre (Rome III), Integrating Plasma into Electromagnetic Metadevices: Toward Reconfigurable Metasurfaces and Metagratings
- Space Plasma Physics and Technology - Profs. Wonho Choe (KAIST, Korea) and Stephane Mazouffre (CNRS, France)
- Stephane Mazouffre, ICARE, CNRS, France, Cathode material influence upon the discharge properties of a low-power vacuum arc thruster
- Kazunori Takahashi, Tohoku University, Japan, Magnetic nozzle rf plasma thruster: fundamental physics and current performance
- Kil-Byoung Chai, Korea Atomic Energy Research Institute, Korea, Effect of applied magnetic fields on the performance and discharge characteristics of MPD thrusters
- Zun Zhang, Beihang University, China, Several Issues Considered in Plasma Diagnostics
- Mario Merino, Universidad Carlos III de Madrid, Spain, Kinetic and Electromagnetic simulation of Electrodeless Plasma Thrusters
- Hiroyuki Koizumi, University of Tokyo, Japan, Development of Electric Propulsion Systems Using Water Plasma - Gridded Ion Thruster and Hall-effect Thruster
- Dan Lev, Georgia Institute of Technology, USA, Overview of recent activities and research interest in the US
- Georg Herdrich, Institute of Space Systems, Germany, TBD
- Industrial Applications of Plasma Technology to Microelectronics - Drs. Sangki Nam (Samsung Electronics, Korea) and Jung-Sik Yoon (KFE, Korea)
- JongChul Park, Samsung, Electronics, S. Korea, Ion and Radical Control Technologies for the Next Generation Semiconductor Fabrication
- Yeonghun Han, SK Hynix, DRAM Memory High Aspect Ration Etch (HARC) Case Study, Opportunity, Challenges
- Jin-Chul Son, PSK, Korea, Mild Surface Treatment Device for Semiconductor process
- Jong-Sik Kim, Korea Institute of Fusion Energy, Plasma Equipment Intelligence research in KFE
- Ki Chul Um, ASE Co., Ltd.,TBD
- Kukhan Yoon, Samsung Electronics, S. Korea, Challenges and solutions for fine pitch high aspect ratio patterning in sub-10nm DRAM device
- Sang Wok Park, Samsung Electronics, S. Korea, Opportunities and Challenges at the Edge of Scaling in Advanced Memory and Foundry Technologies
- Kisuk Sung, RTM, TBD
- Combining Plasma Modeling and Artificial Intelligence - Profs. Byungjo Kim (UNIST) and Ho Jun Kim (Hanyang University Erica, Korea)
- Peter Ventzek, TEL America, Integrated modeling and simulation incorporating machine learning methods: case studies and perspectives on usefulness
- Changho Hong, Seoul National University, Atomistic Simulation of reactive ion etching using machine learning interatomic potentials
- Hyungseon Song, Quantemol, Quantitative Analysis of Mono-Energetic Ion Flux Control in Atomic Layer Etching via Tailored Waveform Profiles
- Byungjo Kim, UNIST, Bridging Plasma Equipment and Surface Processes: Insights from Simulation and AI
- Rohini Mishra, Lam Research, PIC Simulation of ICP equipment using K-PIC code
- Hae June Lee, Pusan National University, S. Korea, Enhancement of the simulation Speed of a PIC simulation combined with ML technology
- Andrew Christlieb, Michigan State University, USA, AI/ML in Fusion research
- Kentaro Hara, Stanford University, USA, TBD
